Patent · US Active

EUV mask blank absorber defect reduction

US11454876B2 · kind B2 · utility

0Cited by

0References

20Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Binni Varghese · Singapore, SG
Vibhu Jindal · Milpitas, US
Azeddine Zerrade · Boise, US
Shiyu Liu · Mountain View, US
Ramya Ramalingam · Singapore, SG

Key dates

Filing date	Dec 14, 2020
Grant date	Sep 27, 2022
Priority date	—
Expiry date	May 28, 2041

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/54
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Methods of coating extreme ultraviolet (EUV) reticle carrier assemblies are disclosed. The method includes depositing an adhesion layer on the EUV reticle carrier assembly, depositing at least one EUV absorber layer on the EUV reticle carrier assembly and depositing a stress-relieving layer on EUV reticle carrier assembly. The coated EUV reticle carrier assemblies exhibit reduced particle defect generation during EUV mask blank manufacturing.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.