Inventor · Boise, ID, US

Azeddine Zerrade

13Patents

2h-index

14Co-inventors

47Inventor score

Filing activity: Oct 14, 2003 → Apr 20, 2021

Most-cited inventions

Patent	Title	Area	Cited by	Status
US7767365B2	Methods for forming and cleaning photolithography reticles	Physics	3	Active
US11300871B2	Extreme ultraviolet mask absorber materials	Physics	2	Active
US7147974B2	Methods for converting reticle configurations	Physics	2	Expired
US11537040B2	Extreme ultraviolet mask blank hard mask materials	Physics	0	Active
US11815809B2	Extreme ultraviolet mask absorber materials	General	0	Revoked
US11556053B2	Extreme ultraviolet mask blank hard mask materials	Physics	0	Active
US11454876B2	EUV mask blank absorber defect reduction	Physics	0	Active
US11640109B2	Extreme ultraviolet mask absorber materials	Physics	0	Active
US11789358B2	Extreme ultraviolet mask blank defect reduction	Physics	0	Active
US11669008B2	Extreme ultraviolet mask blank defect reduction methods	Physics	0	Active
US11630385B2	Extreme ultraviolet mask absorber materials	Physics	0	Active
US11860533B2	Extreme ultraviolet mask absorber materials	Physics	0	Active
US7592105B2	Methods for converting reticle configurations and methods for modifying reticles	Physics	0	Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.