Patent · US Active

Sealing structure, vacuum processing apparatus and sealing method

US11476132B2 · kind B2 · utility

0Cited by
3References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 1, 2020
Grant dateOct 18, 2022
Priority date
Expiry dateJul 1, 2040

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/67103
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A sealing structure of a gas supply line assembly connected to a processing chamber for processing a substrate in a vacuum atmosphere is provided. The sealing structure includes a first pipe member constituting the gas supply line assembly and having an end surface where an opening communicating with the processing chamber is formed, a second pipe member constituting the gas supply line assembly and having a facing surface facing the end surface of the first pipe member, and a sealing member made of an elastomer disposed between the end surface of the first pipe member and the facing surface of the second pipe member to surround the opening. The sealing structure further includes a sheet-shaped porous member disposed between the end surface of the first pipe member and the facing surface of the second pipe member to surround a vicinity of the sealing member.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.