Method and apparatus to anneal EUV mask blank
US11480866B2 · kind B2 · utility
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3References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 15, 2020 |
| Grant date | Oct 25, 2022 |
| Priority date | — |
| Expiry date | Jun 5, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/44
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Apparatus and methods to improve centroid wavelength uniformity of EUV mask blanks are disclosed. The apparatus and methods may utilize one or more of heating the backside and/or the front side of the EUV mask blank. Selected regions and sub regions of the EUV mask blank are selectively heated, resulting in improved centroid wavelength uniformity of EUV mask blanks.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.