Plasma processing apparatus
US11482435B2 · kind B2 · utility
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6Claims
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Key dates
| Filing date | Sep 6, 2019 |
| Grant date | Oct 25, 2022 |
| Priority date | — |
| Expiry date | Oct 5, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32935
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In a plasma processing apparatus, an additional viewing window is disposed between an infrared temperature sensor and a view window, and the additional viewing window is cooled to be retained at room temperature (20° C. to 25° C.), to reduce and to stabilize electromagnetic waves emitted from the viewing window. By correcting the value of the electromagnetic waves, the measurement precision of the temperature monitor is increased and it is possible to measure and to control the dielectric window temperature in a stable state.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.