Metal contamination prevention method and apparatus, and substrate processing method using the same and apparatus therefor
US11486043B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 30, 2019 |
| Grant date | Nov 1, 2022 |
| Priority date | — |
| Expiry date | Mar 28, 2041 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4585
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
There is provided a metal contamination prevention method performed by passing a metal chloride gas through a metal component having a surface covered with an inactive film formed of a chromium oxide, the method including: generating a chromium chloride (III) hexahydrate by supplying a hydrochloric acid to the inactive film covering the surface of the metal component and allowing the chromium oxide to react with the hydrochloric acid; removing a chromium from the inactive film by evaporating the chromium chloride (III) hexahydrate; and covering a surface of the inactive film with a compound containing a metal contained in the metal chloride gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.