Apparatus for cleaning semiconductor substrates

US11498100B2 · kind B2 · utility

Assignee

• ACM RESEARCH (SHANGHAI), INC. · CN

Inventors

• Hui Wang · Shanghai, CN
• Xiaofeng Tao · Beijing, CN
• Fuping Chen · Shanghai, CN
• Shena Jia · Shanghai, CN
• Xi Wang · Shanghai, CN
• Xiaoyan Zhang · Shanghai, CN
• Xuejun Li · Shanghai, CN

Key dates

• Filing date: Mar 6, 2017
• Grant date: Nov 15, 2022
• Expiry date: Jul 15, 2038

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/76
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

An apparatus for cleaning semiconductor substrates including a chamber, a chuck, a liquid collector, an enclosing wall, at least one driving mechanism, at least one internal dispenser, and at least one external dispenser. The chamber has a top wall, a side wall and a bottom wall. The chuck is disposed in the chamber. The liquid collector surrounds the chuck. The enclosing wall surrounds the liquid collector. The driving mechanism drives the enclosing wall to move up and down, wherein when the enclosing wall is driven to move up, a seal room is formed by the liquid collector, the enclosing wall, the top wall and bottom wall of the chamber. The internal dispenser is disposed inside the seal room. The external dispenser is disposed outside the seal room and capable of getting in and out of the seal room after the enclosing wall is driven to move down.