Fuping Chen
35Patents
2h-index
28Co-inventors
53Inventor score
Filing activity: Nov 27, 2012 → Feb 13, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10410906B2 | Substrate supporting apparatus | Emerging Cross-Sectional Technologies | 3 | Active |
| US11141762B2 | System for cleaning semiconductor wafers | Physics | 2 | Active |
| US10297472B2 | Method and apparatus for cleaning semiconductor wafer | Electricity | 2 | Active |
| US11581205B2 | Methods and system for cleaning semiconductor wafers | Electricity | 1 | Active |
| US11037804B2 | Methods and apparatus for cleaning substrates | Emerging Cross-Sectional Technologies | 1 | Active |
| US11257667B2 | Methods and apparatus for cleaning semiconductor wafers | Electricity | 1 | Active |
| US10910244B2 | Methods and system for cleaning semiconductor wafers | Electricity | 1 | Active |
| US10113244B2 | Method and apparatus for uniformly metallization on substrate | Chemistry; Metallurgy | 0 | Active |
| US12186684B2 | Method and apparatus for cleaning substrates using high temperature chemicals and ultrasonic device | Mechanical Engineering; Lighting; Heating | 0 | Active |
| US11911807B2 | Method and apparatus for cleaning substrates | Performing Operations; Transporting | 0 | Active |
| US11752529B2 | Method for cleaning semiconductor wafers | Physics | 0 | Active |
| US12062556B2 | Methods and apparatus for cleaning semiconductor wafers | Electricity | 0 | Active |
| US11848217B2 | Methods and apparatus for cleaning substrates | Emerging Cross-Sectional Technologies | 0 | Active |
| US12334367B2 | Method and apparatus for removing particles or photoresist on substrates | Electricity | 0 | Active |
| US11629425B2 | Method and apparatus for uniformly metallization on substrate | Chemistry; Metallurgy | 0 | Active |
| US11854842B2 | Substrate heat treatment apparatus | Electricity | 0 | Active |
| US11955328B2 | Method and apparatus for cleaning semiconductor wafer | Electricity | 0 | Active |
| US11103898B2 | Methods and apparatus for cleaning substrates | Performing Operations; Transporting | 0 | Active |
| US10907266B2 | Method and apparatus for uniformly metallization on substrate | Chemistry; Metallurgy | 0 | Active |
| US11462423B2 | Method and apparatus for cleaning semiconductor wafer | Electricity | 0 | Active |
| US11967497B2 | Methods and apparatus for cleaning semiconductor wafers | Electricity | 0 | Active |
| US11335550B2 | Method and apparatus for cleaning semiconductor wafer | Electricity | 0 | Active |
| US11498100B2 | Apparatus for cleaning semiconductor substrates | Electricity | 0 | Active |
| US11633765B2 | System for cleaning semiconductor wafers | Physics | 0 | Active |
| US11876005B2 | Methods and apparatus for cleaning flip chip assemblies | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.