Inventor · Shanghai, CN

Xi Wang

73Patents
4h-index
85Co-inventors
65Inventor score

Filing activity: Nov 2, 2007 → Feb 13, 2024

Most-cited inventions

PatentTitleAreaCited byStatus
US8350298B2 Hybrid material inversion mode GAA CMOSFET Electricity 24 Active
US8580659B2 Method of fabricating high-mobility dual channel material based on SOI substrate Electricity 10 Active
US8274119B2 Hybrid material accumulation mode GAA CMOSFET Electricity 4 Active
US8274118B2 Hybrid material accumulation mode GAA CMOSFET Electricity 4 Active
US8233312B2 DRAM cell utilizing floating body effect and manufacturing method thereof Physics 4 Active
US11254126B2 Device and method for coating surfaces Electricity 3 Active
US8518224B2 Plating apparatus for metallization on semiconductor workpiece Chemistry; Metallurgy 3 Active
US8354721B2 Gate-all-around CMOSFET devices Electricity 3 Active
US11141762B2 System for cleaning semiconductor wafers Physics 2 Active
US8422288B2 DRAM cell utilizing floating body effect and manufacturing method thereof Physics 2 Active
US8937354B2 PD SOI device with a body contact structure Electricity 2 Active
US10297472B2 Method and apparatus for cleaning semiconductor wafer Electricity 2 Active
US8629029B2 Vertical SOI bipolar junction transistor and manufacturing method thereof Electricity 2 Active
US8264042B2 Hybrid orientation accumulation mode GAA CMOSFET Electricity 1 Active
US11037804B2 Methods and apparatus for cleaning substrates Emerging Cross-Sectional Technologies 1 Active
US8461651B2 ESD protection devices for SOI integrated circuit and manufacturing method thereof Electricity 1 Active
US10917864B2 Method and device for realizing synchronization Electricity 1 Active
US8710549B2 MOS device for eliminating floating body effects and self-heating effects Electricity 1 Active
US8354714B2 SOI MOS device having BTS structure and manufacturing method thereof Electricity 1 Active
US10910244B2 Methods and system for cleaning semiconductor wafers Electricity 1 Active
US8450195B2 Method of reducing floating body effect of SOI MOS device via a large tilt ion implantation Electricity 1 Active
US11581205B2 Methods and system for cleaning semiconductor wafers Electricity 1 Active
US9666426B2 Methods and apparatus for uniformly metallization on substrates Electricity 1 Active
US10141205B2 Apparatus and method for cleaning semiconductor wafer Electricity 1 Active
US11257667B2 Methods and apparatus for cleaning semiconductor wafers Electricity 1 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.