Patent · US Active

Optical wall and process sensor with plasma facing sensor

US11499869B2 · kind B2 · utility

7Cited by

7References

5Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Chuang-Chia Lin · Diamond Bar, US
Upendra Ummethala · Cupertino, US

Key dates

Filing date	Nov 13, 2019
Grant date	Nov 15, 2022
Priority date	—
Expiry date	Mar 17, 2041

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/334
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

Embodiments disclosed herein include an optical sensor system for use in plasma processing tools. In an embodiment, the optical sensor system, comprises an optically clear body with a first surface and a second surface facing away from the first surface. In an embodiment, the optically clear body further comprises a third surface that is recessed from the second surface. In an embodiment, the optical sensor system further comprises a target over the third surface and a first reflector to optically couple the first surface to the target.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.