Gas-pulsing-based shared precursor distribution system and methods of use
US11520358B2 · kind B2 · utility
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3Claims
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Key dates
| Filing date | Nov 8, 2021 |
| Grant date | Dec 6, 2022 |
| Priority date | — |
| Expiry date | Nov 8, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01F25/17
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Gas distribution apparatus to provide uniform flows of gases from a single source to multiple processing chambers are described. A regulator is positioned at an upstream end of a shared volume having a plurality of downstream ends. A flow controller is positioned at each downstream end of the shared volume, the flow controller comprising an orifice and a fast pulsing valve. Methods of using the gas distribution apparatus and calibrating the flow controllers are also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.