Method and apparatus for providing station to station uniformity
US11542599B2 · kind B2 · utility
0Cited by
2References
3Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 14, 2020 |
| Grant date | Jan 3, 2023 |
| Priority date | — |
| Expiry date | Nov 5, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/20
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for processing stacks is provided. A first gas source is provided. A first gas manifold is connected to the first gas source. A first processing station has a first gas outlet, wherein the first gas outlet is connected to the first gas manifold. A first variable conductance valve is between the first gas source and the first gas outlet along the first gas manifold.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.