Patent · US Active

Developer critical dimension control with pulse development

US11543793B2 · kind B2 · utility

0Cited by

16References

15Claims

0Family size

Assignee

International Business Machines Corporation · US

Inventors

Richard C. Johnson · Selkirk, US
Hao Tang · Slingerlands, US
Yongan Xu · Niskayuna, US

Key dates

Filing date	Nov 22, 2019
Grant date	Jan 3, 2023
Priority date	—
Expiry date	Jul 15, 2041

Classification

Technology area (CPC G)Physics
CPC primaryG05B2219/45031
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Embodiments of the invention include methods and structures for controlling developer critical dimension (DCD) variations across a wafer surface. Aspects of the invention include an apparatus having developer tubing and an internal cam. The internal cam is coupled to a fixed axis. A flexible divider is positioned between the developer tubing and the internal cam. The flexible divider is coupled to the internal cam such that rotation of the internal cam about the fixed axis is operable to change an inner diameter of the developer tubing.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.