Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing films

US11549182B2 · kind B2 · utility

Assignee

• L'Air Liquide, Societe Anonyme Pour l'Etude et l'Exploitation des Procedes Georges Claude · FR

Inventors

• Clément Lansalot-Matras · Tsukuba, JP
• Julien Lieffrig · Soucy, FR
• Christian Dussarrat · Tokyo, JP
• Antoine COLAS · Ozoir-la-Ferrière, FR
• Jong Min Kim · Yongin-si, KR

Key dates

• Filing date: Sep 30, 2021
• Grant date: Jan 10, 2023
• Expiry date: Sep 30, 2041

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/405
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Disclosed are Group 6 film forming compositions comprising Group 6 transition metal-containing precursors selected from the group consisting of: M(=O)2(OR)2  Formula I,M(=O)(NR2)4  Formula II,M(=O)2(NR2)2  Formula III,M(=NR)2(OR)2  Formula IV, andM(=O)(OR)4  Formula V, wherein M is Mo or W and each R is independently H, a C1 to C6 alkyl group, or SiR′3, wherein R′ is H or a C1 to C6 alkyl group. Also disclosed are methods of synthesizing and using the disclosed compositions to deposit Group 6 transition metal-containing films on substrates via vapor deposition processes.