Object in a lithographic apparatus
US11550234B2 · kind B2 · utility
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20Claims
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Assignee
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Key dates
| Filing date | Sep 25, 2019 |
| Grant date | Jan 10, 2023 |
| Priority date | — |
| Expiry date | Sep 25, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An object, such as a sensor for an immersion lithographic apparatus, has an outer layer which comes in contact with immersion liquid and wherein the outer layer has a composition including a rare earth element. There is also provided an immersion lithographic apparatus having such an object and a method for manufacturing such an object.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.