Training methods for machine learning assisted optical proximity error correction
US11561477B2 · kind B2 · utility
2Cited by
5References
20Claims
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Key dates
| Filing date | Sep 5, 2018 |
| Grant date | Jan 24, 2023 |
| Priority date | — |
| Expiry date | Sep 6, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06N20/20
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method including: obtaining data based an optical proximity correction for a spatially shifted version of a training design pattern; and training a machine learning model configured to predict optical proximity corrections for design patterns using data regarding the training design pattern and the data based on the optical proximity correction for the spatially shifted version of the training design pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.