Patent · US Active

Conditioning treatment for ALD productivity

US11566324B2 · kind B2 · utility

0Cited by

1References

12Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Christina L. Engler · Union City, US
Lu Chen · Pingtung City, TW

Key dates

Filing date	Feb 27, 2020
Grant date	Jan 31, 2023
Priority date	—
Expiry date	Mar 29, 2040

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/28562
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

Deposition methods and apparatus for conditioning a process kit to increase process kit lifetime are described. A nitride film formed on a process kit is exposed to conditioning process comprising nitrogen and hydrogen radicals to condition the nitride film to decrease particulate contamination from the process kit.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.