Apparatus, system and method for energy spread ion beam
US11569063B2 · kind B2 · utility
1Cited by
1References
20Claims
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Key dates
| Filing date | Apr 2, 2021 |
| Grant date | Jan 31, 2023 |
| Priority date | — |
| Expiry date | Apr 2, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/265
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An ion implanter may include an ion source, arranged to generate a continuous ion beam, a DC acceleration system, to accelerate the continuous ion beam, as well as an AC linear accelerator to receive the continuous ion beam and to output a bunched ion beam. The ion implanter may also include an energy spreading electrode assembly, to receive the bunched ion beam and to apply an RF voltage between a plurality of electrodes of the energy spreading electrode assembly, along a local direction of propagation of the bunched ion beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.