Dual XY variable aperture in an ion implantation system
US11574796B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 21, 2021 |
| Grant date | Feb 7, 2023 |
| Priority date | — |
| Expiry date | Jul 21, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0455
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An aperture diaphragm capable of varying the size of an aperture in two dimensions is disclosed. The aperture diaphragm may be utilized in an ion implantation system, such as between the mass analyzer and the acceleration column. In this way, the aperture diaphragm may be used to control at least one parameter of the ion beam. These parameters may include angular spread in the height direction, angular spread in the width direction, beam current or cross-sectional area. Various embodiments of the aperture diaphragm are shown. In certain embodiments, the size of the aperture in the height and width directions may be independently controlled, while in other embodiments, the ratio between height and width is constant.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.