Substrate holder, a lithographic apparatus and method of manufacturing devices
US11579533B2 · kind B2 · utility
0Cited by
6References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 18, 2021 |
| Grant date | Feb 14, 2023 |
| Priority date | — |
| Expiry date | Jan 18, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70858
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.