Wavefront optimization for tuning scanner based on performance matching

US11586114B2 · kind B2 · utility

Assignee

• ASML NETHERLANDS B.V. · NL

Inventors

• Duan-Fu Stephen Hsu · Fremont, US
• Christoph Hennerkes · Wertingen, DE
• Rafael C. Howell · Santa Clara, US
• Zhan Shi · San Jose, US
• Xiaoyang Li · Fremont, US
• Frank Staals · Eindhoven, NL

Key dates

• Filing date: Jun 21, 2019
• Grant date: Feb 21, 2023
• Expiry date: Jun 21, 2039

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/7055
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A method for determining a wavefront parameter of a patterning process. The method includes obtaining a reference performance (e.g., a contour, EPE, CD) of a reference apparatus (e.g., a scanner), a lens model for a patterning apparatus configured to convert a wavefront parameter of a wavefront to actuator movement, and a lens fingerprint of a tuning apparatus (e.g., a to-be-matched scanner). Further, the method involves determining the wavefront parameter (e.g., a wavefront parameter such as tilt, offset, etc.) based on the lens fingerprint of the tuning apparatus, the lens model, and a cost function, wherein the cost function is a difference between the reference performance and a tuning apparatus performance.