Patent · US Active

Substrate pedestal for improved substrate processing

US11587773B2 · kind B2 · utility

0Cited by

2References

12Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Viren Kalsekar · Sunnyvale, US
Vinay Prabhakar · Cupertino, US
Venkata Sharat Chandra Parimi · Sunnyvale, US

Key dates

Filing date	Mar 10, 2020
Grant date	Feb 21, 2023
Priority date	—
Expiry date	Jan 30, 2041

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/24564
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

A substrate pedestal includes a thermally conductive substrate support including a mesh, a thermally conductive shaft including a plurality of conductive rods therein, each conductive rod having a first end and a second end, and a sensor. The first end of each conductive rod is electrically coupled to the mesh, and the sensor is disposed between the first and second ends of each conductive rod and configured to detect current flow through each conductive rod.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.