Patent · US Active

Rotary body module and chemical mechanical polishing apparatus having the same

US11590628B2 · kind B2 · utility

0Cited by
13References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 20, 2020
Grant dateFeb 28, 2023
Priority date
Expiry dateJul 26, 2041

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB24B37/30
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

A chemical mechanical polishing apparatus includes a fixing portion; and a rotary body module including a rotating shaft rotatably installed on the fixing portion, a first rotating unit connected to the rotating shaft and on which a wafer is mounted, and a second rotating unit disposed around the first rotating unit and on which a retainer ring is mounted, wherein the fixing portion comprises a first driving member disposed above the first rotating unit and a second driving member disposed above the second rotating unit, wherein the first and second driving members are comprised of a magnet or an electromagnet, wherein a first magnet, disposed opposite to the first driving member, is provided in the first rotating unit, and a second magnet, disposed opposite to the second driving member, is provided in the second rotating unit, and wherein the first rotating unit and the second rotating unit are independently tilted.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.