Yungjun Kim
5Patents
2h-index
16Co-inventors
40Inventor score
Filing activity: Feb 9, 2017 → Mar 30, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10825698B2 | Substrate drying apparatus, facility of manufacturing semiconductor device, and method of drying substrate | Electricity | 2 | Active |
| US10388537B2 | Cleaning apparatus, chemical mechanical polishing system including the same, cleaning method after chemical mechanical polishing, and method of manufacturing semiconductor device including the same | Electricity | 2 | Active |
| US10991600B2 | Process chamber and substrate processing apparatus including the same | Electricity | 1 | Active |
| US11590628B2 | Rotary body module and chemical mechanical polishing apparatus having the same | Performing Operations; Transporting | 0 | Active |
| US11610788B2 | Process chamber and substrate processing apparatus including the same | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.