Real time bias detection and correction for electrostatic chuck
US11594440B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 21, 2020 |
| Grant date | Feb 28, 2023 |
| Priority date | — |
| Expiry date | Oct 21, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68714
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method reduces differences in chucking forces that are applied by two electrodes of an electrostatic chuck, to a substrate disposed atop the chuck. The method includes providing initial chucking voltages to each of the two electrodes, and measuring an initial current provided to at least a first electrode of the two electrodes. The method further includes initiating a process that affects a DC voltage of the substrate, then measuring a modified current provided to at least the first electrode, and determining, based at least on the initial current and the modified current, a modified chucking voltage for a selected one of the two electrodes, that will reduce chucking force imbalance across the substrate. The method also includes providing the modified chucking voltage to the selected one of the two electrodes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.