Lid assembly apparatus and methods for substrate processing chambers

US11598004B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Hanish Kumar Panavalappil Kumarankutty · Bengaluru, IN
• Prashant A. DESAI · Kanchinakote, IN
• Diwakar Kedlaya · San Jose, US
• Sumit Agarwal · Dublin, US
• Vidyadharan Srinivasa Murthy Bangalore · Bengaluru, IN
• Truong Van Nguyen · Milpitas, US
• Zubin Huang · Santa Clara, US

Key dates

• Filing date: Feb 26, 2020
• Grant date: Mar 7, 2023
• Expiry date: Mar 23, 2040

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/45574
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

The present disclosure relates to a lid assembly apparatus and related methods for substrate processing chambers. In one implementation, a lid assembly includes a gas manifold. The gas manifold includes a first gas channel configured to receive a process gas, a second gas channel configured to receive a doping gas, and a third gas channel configured to receive a cleaning gas. The lid assembly also includes a showerhead. The showerhead includes one or more first gas openings that are configured to receive the process gas, and one or more second gas openings that are configured to receive the doping gas.