Patent · US Active

Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD process

US11600477B2 · kind B2 · utility

1Cited by

3References

19Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Kirankumar Neelasandra SAVANDAIAH · Bengaluru, IN
Shane Lavan · Palo Alto, US
Sundarapandian Ramalinga Vijayalakshmi REDDY · Kanchinakote, IN
Randal Dean Schmieding · Saratoga, US
Yong Cao · Goleta, US

Key dates

Filing date	Dec 14, 2020
Grant date	Mar 7, 2023
Priority date	—
Expiry date	Feb 7, 2041

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3488
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Embodiments of process shield for use in process chambers are provided herein. In some embodiments, a process shield for use in a process chamber includes: an annular body having an upper portion and a lower portion extending downward and radially inward from the upper portion, wherein the upper portion includes a plurality of annular trenches on an upper surface thereof and having a plurality of slots disposed therebetween to fluidly couple the plurality of annular trenches, wherein one or more inlets extend from an outer surface of the annular body to an outermost trench of the plurality of annular trenches.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.