Patent · US Active

Multi-channel device and method for measuring distortion and magnification of objective lens

US11604418B2 · kind B2 · utility

0Cited by

0References

9Claims

0Family size

Assignee

Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences · CN

Inventors

Yisha Cao · Shanghai, CN
Feng Tang · Geneva, US
Xiangzhao Wang · Shanghai, CN
Yang Liu · Beijing, CN
Yunjun Lu · Shanghai, CN

Key dates

Filing date	Dec 9, 2021
Grant date	Mar 14, 2023
Priority date	—
Expiry date	Dec 9, 2041

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/7085
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A multi-channel device and method for measuring the distortion and magnification of objective lens. The multi-channel device for measuring the distortion and magnification of objective lens comprises an illumination system, a reticle stage, a test reticle, a projection objective lens, a wafer stage and a multi-channel image plane sensor, wherein the multi-channel image plane sensor simultaneously measures the image placement shifts between actual image points and nominal image points after a plurality of object plane test marks are imaged by the projection objective lens, and calculates the distortion and magnification errors of the objective lens by fitting, which shortens the measurement time, eliminates the influence of wafer stage errors on the measurement accuracy and improves the measurement accuracy.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.