High-resolution multiple beam source
US11615938B2 · kind B2 · utility
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6References
18Claims
0Family size
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Key dates
| Filing date | Dec 20, 2019 |
| Grant date | Mar 28, 2023 |
| Priority date | — |
| Expiry date | Jan 29, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/06341
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A thermal field emitter, an apparatus, and a method for generating multiple beams for an e-beam tool are provided. The thermal field emitter includes an electron emitting portion configured to emit an electron beam and a nano-aperture array (NAA) having a plurality of openings. The NAA is positioned in a path of the electron beam. The NAA is configured to form multiple beams. The multiple beams include electrons from the electron beam that pass through the plurality of openings.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.