Patent · US Active

PVD target having self-retained low friction pads

US11618943B2 · kind B2 · utility

0Cited by

4References

17Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Ilya Lavitsky · San Francisco, US
Keith A. Miller · Schererville, US

Key dates

Filing date	Oct 23, 2020
Grant date	Apr 4, 2023
Priority date	—
Expiry date	Feb 16, 2041

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C14/3414
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

Embodiments of target assemblies for use in substrate processing chambers are provided herein. In some embodiments, a target assembly includes a plate comprising a first side including a central portion and a support portion, a target disposed on the central portion, a plurality of recesses formed in the support portion; and a plurality of self-retained low-friction pads partially disposed in the plurality of recesses, wherein each of the plurality of low-friction pads includes a solid body portion, and a self-retaining stem that extends outward from a bottom of the solid body portion, wherein the self-retaining stem includes a first stem portion disposed in the first through-hole portion, and a second stem portion disposed within the second through-hole portion.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.