Inventor · San Francisco, CA, US

Ilya Lavitsky

22Patents
9h-index
26Co-inventors
75Inventor score

Filing activity: Jan 17, 2002 → Jul 11, 2022

Most-cited inventions

PatentTitleAreaCited byStatus
USD934315S1 Deposition ring for a substrate processing chamber General 28 Active
US6730174B2 Unitary removable shield assembly Chemistry; Metallurgy 27 Expired
USD937329S1 Sputter target for a physical vapor deposition chamber General 17 Active
USD941372S1 Process shield for a substrate processing chamber General 17 Active
US7041201B2 Sidewall magnet improving uniformity of inductively coupled plasma and shields used therewith Electricity 16 Expired
USD941371S1 Process shield for a substrate processing chamber General 16 Active
US7670436B2 Support ring assembly Emerging Cross-Sectional Technologies 16 Expired
US7569125B2 Shields usable with an inductively coupled plasma reactor Electricity 12 Active
USD970566S1 Sputter target for a physical vapor deposition chamber General 9 Active
US6776848B2 Motorized chamber lid Fixed Constructions 9 Expired
US7371285B2 Motorized chamber lid Fixed Constructions 4 Expired
US8865602B2 Edge ring lip Electricity 4 Active
US6688838B2 Cleanroom lift having an articulated arm Performing Operations; Transporting 2 Expired
US10998172B2 Substrate processing chamber having improved process volume sealing Electricity 2 Active
US11915918B2 Cleaning of sin with CCP plasma or RPS clean Electricity 2 Active
US11670493B2 Isolator ring clamp and physical vapor deposition chamber incorporating same Electricity 1 Active
US9564348B2 Shutter blade and robot blade with CTE compensation Electricity 1 Active
US9928997B2 Apparatus for PVD dielectric deposition Electricity 1 Active
US12027354B2 Cleaning of SIN with CCP plasma or RPS clean Electricity 0 Active
US11618943B2 PVD target having self-retained low friction pads Chemistry; Metallurgy 0 Active
USD1037954S1 Self-retained low friction pad General 0 Active
US11339466B2 Heated shield for physical vapor deposition chamber Chemistry; Metallurgy 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.