Substrate processing apparatus and method for processing substrates
US11629407B2 · kind B2 · utility
1Cited by
2,211References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 21, 2020 |
| Grant date | Apr 18, 2023 |
| Priority date | — |
| Expiry date | Apr 27, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67769
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The disclosure relates to a substrate processing apparatus, comprising: a first reactor constructed and arranged to process a rack with a plurality of substrates therein; a second reactor constructed and arranged to process a substrate; and, a substrate transfer device constructed and arranged to transfer substrates to and from the first and second reactor. The second reactor may be provided with an illumination system constructed and arranged to irradiate ultraviolet radiation within a range from 100 to 500 nanometers onto a top surface of at least a substrate in the second reactor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.