Patent · US Active

Method, computer program and apparatus for determining a quality of a mask of a photolithography apparatus

US11631168B2 · kind B2 · utility

0Cited by

2References

16Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Tom Moebert · Laasen, DE
Dirk Seidel · Jena, DE
Carsten Schmidt · Jena, DE
Konrad Schoebel · Weimar, DE

Key dates

Filing date	Jun 26, 2020
Grant date	Apr 18, 2023
Priority date	—
Expiry date	May 7, 2041

Classification

Technology area (CPC G)Physics
CPC primaryG06T2207/30148
WIPO fieldComputer technology
WIPO sectorElectrical engineering

Abstract

Methods and apparatuses for determining a quality of a mask of a photolithography apparatus are provided, which comprise a parallel calculation, using a plurality of computing devices, of a reference aerial image on the basis of a design of the mask and optical properties of the photolithography apparatus on a plurality of computing devices.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.