Patent · US Active

Mask assembly and associated methods

US11635681B2 · kind B2 · utility

0Cited by
24References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 14, 2021
Grant dateApr 25, 2023
Priority date
Expiry dateJul 23, 2041

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F1/84
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.