James Wiley
25Patents
9h-index
48Co-inventors
75Inventor score
Filing activity: Sep 19, 1997 → Apr 25, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6529621B1 | Mechanisms for making and inspecting reticles | Physics | 78 | Expired |
| US6076465A | System and method for determining reticle defect printability | Physics | 76 | Expired |
| US7853920B2 | Method for detecting, sampling, analyzing, and correcting marginal patterns in integrated circuit manufacturing | Physics | 49 | Active |
| US7695876B2 | Method for identifying and using process window signature patterns for lithography process control | Physics | 42 | Active |
| US6748103B2 | Mechanisms for making and inspecting reticles | Physics | 41 | Expired |
| US8057967B2 | Process window signature patterns for lithography process control | Physics | 27 | Active |
| US6516085B1 | Apparatus and methods for collecting global data during a reticle inspection | Physics | 21 | Expired |
| US8056028B2 | Method of performing mask-writer tuning and optimization | Physics | 12 | Active |
| US6654489B2 | Apparatus and methods for collecting global data during a reticle inspection | Physics | 10 | Expired |
| US9002497B2 | Methods and systems for inspection of wafers and reticles using designer intent data | Physics | 8 | Active |
| US6381358B1 | System and method for determining reticle defect printability | Physics | 7 | Expired |
| US8318391B2 | Process window signature patterns for lithography process control | Physics | 6 | Active |
| US10139725B2 | Lithographic apparatus | Physics | 6 | Active |
| US10571800B2 | Mask assembly and associated methods | Physics | 5 | Active |
| US6731787B1 | System and method for determining reticle defect printability | Physics | 3 | Expired |
| US10466585B2 | Pellicle and pellicle assembly | Physics | 2 | Active |
| US11029595B2 | Mask assembly and associated methods | Physics | 1 | Active |
| US11086213B2 | Mask assembly and associated methods | Physics | 1 | Active |
| US10983431B2 | Pellicle and pellicle assembly | Physics | 0 | Active |
| US12066758B2 | Pellicle and pellicle assembly | Physics | 0 | Active |
| US10713771B2 | Methods and systems for inspection of wafers and reticles using designer intent data | Physics | 0 | Active |
| US11287748B2 | Guided patterning device inspection | Physics | 0 | Active |
| US11347142B2 | Pellicle and pellicle assembly | Physics | 0 | Active |
| US11635681B2 | Mask assembly and associated methods | Physics | 0 | Active |
| US11348222B2 | Methods and systems for inspection of wafers and reticles using designer intent data | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.