Patent · US Active

Systems and methods for orientator based wafer defect sensing

US11664260B2 · kind B2 · utility

0Cited by

5References

20Claims

0Family size

Assignee

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. · TW

Inventors

Yan Liu · Meishan City, CN
Daniel Yang · Jinshanmian, TW
Che-Fu Chen · Hsinchu, TW

Key dates

Filing date	Apr 9, 2021
Grant date	May 30, 2023
Priority date	—
Expiry date	Jul 31, 2041

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/68764
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

In an embodiment, a system includes: an orientation sensor configured to detect an orientation fiducial on a bevel of a wafer; a pedestal configured to rotate the wafer to allow the orientation sensor to detect the orientation fiducial and place the orientation fiducial at a predetermined orientation position; and a defect sensor configured to detect a wafer defect along a surface of the wafer while rotated by the pedestal.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.