Apparatus and method for detecting wavefront aberration of objective lens
US11668625B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 10, 2021 |
| Grant date | Jun 6, 2023 |
| Priority date | — |
| Expiry date | Sep 10, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/08
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Apparatus and method for detecting wavefront aberration of an objective lens, comprising a wavefront detection system, a planar mirror, and a planar mirror adjusting mechanism; the objective lens is placed between planar mirror and wavefront detection system; planar mirror is positioned at focal point of the objective lens. A test wavefront emitted by wavefront detection system passes through the objective lens, gets reflected by the planar mirror, and t passes through the objective lens again; the wavefront detection system receives and detects the test wavefront to derive a phase distribution thereof; an angle of the planar mirror tilts at is adjusted to obtain different return wavefronts; a polynomial for expressing wavefront aberration is selected, and expressions corresponding to all the return wavefronts are calculated; result of fitting the wavefront aberration of the objective lens when expressed by the selected polynomial is derived through fitting with the polynomial.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.