Patent · US Active

Roll-to-roll programmable film imprint lithography

US11669009B2 · kind B2 · utility

0Cited by
9References
16Claims
0Family size

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Key dates

Filing dateAug 3, 2017
Grant dateJun 6, 2023
Priority date
Expiry dateJun 9, 2040

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01Q60/24
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method for fabricating patterns on a flexible substrate in a roll-to-roll configuration. Drops of a monomer diluted in a solvent are dispensed on a substrate, where the drops spontaneously spread and merge with one another to form a liquid resist formulation. The solvent is evaporated (e.g., blanket evaporation) from the liquid resist formulation followed by selective multi-component resist film evaporation resulting in a non-uniform and substantially continuous film on the substrate. The gap between the film on the substrate and a template is closed such that the film fills the features of the template. After cross-linking the film to polymerize the film, the template is separated from the substrate thereby leaving the polymerized film on the substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.