Patent · US Active

Isolator ring clamp and physical vapor deposition chamber incorporating same

US11670493B2 · kind B2 · utility

1Cited by

2References

20Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Ilya Lavitsky · San Francisco, US
Keith A. Miller · Schererville, US

Key dates

Filing date	Nov 13, 2020
Grant date	Jun 6, 2023
Priority date	—
Expiry date	Jul 8, 2041

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3488
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Apparatus for physical vapor deposition are provided herein. In some embodiments, a clamp for use in a physical vapor deposition (PVD) chamber includes a clamp body and an outwardly extending shelf that extends from the clamp body, wherein the outwardly extending shelf includes a clamping surface configured to clamp an isolator ring to a chamber body of the PVD chamber, wherein a height of the outwardly extending shelf is about 15 percent to about 40 percent of a height of the clamp body and wherein the clamp body includes a central opening configured to retain a fastener therein.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.