Patent · US Active

Apparatus of plural charged particle beams

US11676793B2 · kind B2 · utility

1Cited by

10References

19Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Weiming Ren · San Jose, US
Xuedong Liu · San Jose, US
Xuerang Hu · San Jose, US
Zhong-Wei Chen · Beijing, CN

Key dates

Filing date	Nov 8, 2019
Grant date	Jun 13, 2023
Priority date	—
Expiry date	Dec 3, 2039

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/2817
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

An electromagnetic compound lens may be configured to focus a charged particle beam. The compound lens may include an electrostatic lens provided on a secondary optical axis and a magnetic lens also provided on the secondary optical axis. The magnetic lens may include a permanent magnet. A charged particle optical system may include a beam separator configured to separate a plurality of beamlets of a primary charged particle beam generated by a source along a primary optical axis from secondary beams of secondary charged particles. The system may include a secondary imaging system configured to focus the secondary beams onto a detector along the secondary optical axis. The secondary imaging system may include the compound lens.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.