Enhanced EUV photoresist materials, formulations and processes

US11681227B2 · kind B2 · utility

Inventors

• Alex Phillip Graham Robinson · Birmingham, GB
• Carmen Popescu · Birmingham, GB
• John Roth · Cohasset, US
• Andreas Frommhold · Köthen, DE
• Edward A. Jackson · Franklin, US
• Alexandra McClelland · Tibberton, GB
• Tom Lada · Somerville, US
• Greg O'Callahan · Birmingham, GB

Key dates

• Filing date: Feb 25, 2019
• Grant date: Jun 20, 2023
• Expiry date: Apr 13, 2040

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70033
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The present disclosure relates to novel negative-type photoresist composition and methods of their use. The disclosure further relates to multiple trigger photoresist processes which allow for the improvement in contrast, resolution, and/or line edges roughness in some systems without giving up sensitivity. The photoresist compositions and the methods of the current disclosure are ideal for fine patent processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays and changed particle. The disclosure further relates to sensitivity enhancing materials useful in the disclosed compositions and methods.