Apparatus and method for extending target material delivery system lifetime
US11690159B2 · kind B2 · utility
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3References
20Claims
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Key dates
| Filing date | Oct 25, 2019 |
| Grant date | Jun 27, 2023 |
| Priority date | — |
| Expiry date | Oct 25, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0027
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
Disclosed is a system for generating EUV radiation in which current flowing through target material in the orifice 320 of a nozzle in a droplet generator is controlled by providing alternate lower impedance paths for the current and/or by limiting a high frequency component of a drive signal applied to the droplet generator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.