Alexander I. Ershov
152Patents
36h-index
176Co-inventors
93Inventor score
Filing activity: Apr 23, 1997 → Oct 16, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7196342B2 | Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source | Physics | 260 | Expired |
| US6128323A | Reliable modular production quality narrow-band high REP rate excimer laser | Electricity | 171 | Expired |
| US6567450B2 | Very narrow band, two chamber, high rep rate gas discharge laser system | Electricity | 144 | Expired |
| US5991324A | Reliable. modular, production quality narrow-band KRF excimer laser | Electricity | 139 | Expired |
| US5856991A | Very narrow band laser | Electricity | 136 | Expired |
| US6625191B2 | Very narrow band, two chamber, high rep rate gas discharge laser system | Electricity | 136 | Expired |
| US6192064A | Narrow band laser with fine wavelength control | Electricity | 135 | Expired |
| US6094448A | Grating assembly with bi-directional bandwidth control | Electricity | 112 | Expired |
| US6535531B1 | Gas discharge laser with pulse multiplier | Electricity | 97 | Expired |
| US6549551B2 | Injection seeded laser with precise timing control | Electricity | 96 | Expired |
| US5835520A | Very narrow band KrF laser | Electricity | 93 | Expired |
| US5970082A | Very narrow band laser | Electricity | 89 | Expired |
| US5982800A | Narrow band excimer laser | Electricity | 87 | Expired |
| US7164144B2 | EUV light source | Physics | 79 | Expired |
| US6028879A | Narrow band laser with etalon based output coupler | Electricity | 79 | Expired |
| US5901163A | Narrow band laser with etalon based output coupler | Electricity | 74 | Expired |
| US5978409A | Line narrowing apparatus with high transparency prism beam expander | Electricity | 74 | Expired |
| US5852627A | Laser with line narrowing output coupler | Electricity | 73 | Expired |
| US6014398A | Narrow band excimer laser with gas additive | Electricity | 70 | Expired |
| US6690704B2 | Control system for a two chamber gas discharge laser | Electricity | 70 | Expired |
| US7405416B2 | Method and apparatus for EUV plasma source target delivery | Electricity | 64 | Expired |
| US6693939B2 | Laser lithography light source with beam delivery | Electricity | 63 | Expired |
| US7491954B2 | Drive laser delivery systems for EUV light source | Electricity | 60 | Active |
| US6381257B1 | Very narrow band injection seeded F2 lithography laser | Electricity | 59 | Expired |
| US6538737B2 | High resolution etalon-grating spectrometer | Physics | 56 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.