Detecting an excursion of a CMP component using time-based sequence of images and machine learning
US11710228B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 23, 2022 |
| Grant date | Jul 25, 2023 |
| Priority date | — |
| Expiry date | Feb 23, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/12
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Monitoring operations of a polishing system includes obtaining a time-based sequence of reference images of a component of the polishing system performing operations during a test operation of the polishing system, receiving from a camera a time-based sequence of monitoring images of an equivalent component of an equivalent polishing system performing operations during polishing of a substrate, determining a difference value for the time-based sequence of monitoring images by comparing the time-based sequence of reference images to the time-based sequence of monitoring image using an image processing algorithm, determining whether the difference value exceeds a threshold, and in response to determining the difference value exceeds the threshold, indicating an excursion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.