Methods and apparatus for calibrating concentration sensors for precursor delivery
US11718912B2 · kind B2 · utility
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1References
12Claims
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Key dates
| Filing date | Jul 17, 2020 |
| Grant date | Aug 8, 2023 |
| Priority date | — |
| Expiry date | Sep 4, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/274
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods and apparatus for controlling precursor flow are provided. In embodiments, the methods and apparatus apparatus for controlling precursor flow to a deposition chamber, includes: an ampoule to output a precursor; a sensor assembly communicatively coupled to the ampoule; and a control system, wherein the control system is configured to calibrate the sensor assembly during flow of a precursor or a chemical standard through the sensor assembly.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.