Apparatus for generating extreme ultraviolet (EUV), method of manufacturing the same, and EUV system
US11729896B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Sep 7, 2021 |
| Grant date | Aug 15, 2023 |
| Priority date | — |
| Expiry date | Feb 5, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K1/10
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus for generating extreme ultraviolet (EUV) light includes a raw material supply unit supplying a plasma source for generating EUV light. An EUV light source unit uses a laser to generate plasma from the plasma source. A filter is configured to extract EUV light from the light. A first protective layer is disposed on a front surface of the filter. A frame having a first region exposing at least a portion of the filter or the first protective layer is disposed on the first protective layer. A width of the first region is smaller than a width of the first protective layer and smaller than or equal to a width of the filter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.