Vapor deposition apparatus and method for coating a substrate in a vacuum chamber

US11732345B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Stefan Bangert · Lauentheil, DE
• Andreas Lopp · Neuses, DE

Key dates

• Filing date: May 27, 2021
• Grant date: Aug 22, 2023
• Expiry date: May 27, 2041

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y02E60/10
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A vapor deposition apparatus is described. The vapor deposition apparatus includes a substrate support for supporting a substrate to be coated; a vapor source with a plurality of nozzles for directing vapor toward the substrate support through a vapor propagation volume; and a heatable shield extending from the vapor source toward the substrate support. The heatable shield surrounds the vapor propagation volume at least partially and includes an edge exclusion portion for masking areas of the substrate not to be coated. The substrate support may be a rotatable drum with a curved drum surface, and the vapor deposition apparatus may be configured to move the substrate on the curved drum surface past the vapor source in a circumferential direction.