Perhydropolysilazane compositions and methods for forming oxide films using same

US11739220B2 · kind B2 · utility

Assignees

• L'Air Liquide, Societe Anonyme Pour l'Etude et l'Exploitation des Procedes Georges Claude · FR
• American Air Liquide, Inc. · US

Inventors

• Antonio Sanchez · Tsukuba, JP
• Gennadiy Itov · Flemington, US
• Manish Khandelwal · Danbury, US
• Cole J. Ritter, III · Easton, US
• Peng Zhang · Montvale, US
• Jean-Marc Girard · Versailles, FR
• Zhiwen Wan · Plano, US
• Glenn Kuchenbeiser · Newark, US
• David Orban · Hampton, US
• Sean Kerrigan · Champaign, US
• Reno Pesaresi · Houston, US
• Matthew Damien Stephens · Kingsport, US
• Yang Wang · Shanghai, CN
• Guillaume Husson · Newark, US
• Grigory Nikiforov · Bound Brook, US

Key dates

• Filing date: Feb 21, 2019
• Grant date: Aug 29, 2023
• Expiry date: Feb 21, 2039

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C08G77/62
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A Si-containing film forming composition comprising a catalyst and/or a polysilane and a N—H free, C-free, and Si-rich perhydropolysilazane having a molecular weight ranging from approximately 332 dalton to approximately 100,000 dalton and comprising N—H free repeating units having the formula [—N(SiH3)x(SiH2-)y], wherein x=0, 1, or 2 and y=0, 1, or 2 with x+y=2; and x=0, 1 or 2 and y=1, 2, or 3 with x+y=3. Also disclosed are synthesis methods and applications for using the same.