Patent · US Active

Method and a device for automatically determining adjustment values for operating parameters of a deposition line

US11739417B2 · kind B2 · utility

0Cited by
2References
16Claims
0Family size

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Key dates

Filing dateDec 7, 2018
Grant dateAug 29, 2023
Priority date
Expiry dateDec 7, 2038

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/24592
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

An adjustment-determining method includes obtaining a mathematical model relating an operating parameter of the deposition line to a quality function defined from a quality measurement of a stack of thin layers deposited by the deposition line on a transparent substrate; obtaining a value of the quality function from a value of the quality measurement measured at the outlet of the deposition line on a stack of thin layers deposited by the deposition line on a substrate while the deposition line was set so that an operating parameter had a current value; and automatically determining by the mathematical model an adjustment value for the current value of the operating parameter serving to reduce a difference that exists between the value obtained for the quality function and a target value selected for the quality function for the stack of thin layers.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.