Charged particle microscope scan masking for three-dimensional reconstruction
US11741730B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 24, 2021 |
| Grant date | Aug 29, 2023 |
| Priority date | — |
| Expiry date | Sep 4, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2803
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Disclosed herein are CPM support systems, as well as related apparatuses, methods, computing devices, and computer-readable media. For example, in some embodiments, a charged particle microscope computational support apparatus may include: first logic to, for each angle of a plurality of angles, receive an associated image of a specimen at the angle, and generate an associated scan mask based on one or more regions-of-interest in the associated image; second logic to, for each angle of the plurality of angles, generate an associated data set of the specimen by processing data from a scan, in accordance with the associated scan mask, by a charged particle microscope of the specimen at the angle; and third logic to provide, for each angle of the plurality of angles, the associated data set of the specimen to reconstruction logic to generate a three-dimensional reconstruction of the specimen.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.